TEAl SSG is an aluminum precursor for atomic layer deposition (ALD) processes.
High Purity Metalorganics
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TEAl SSG is used as a high quality aluminum precursor for atomic layer deposition (ALD) processes in the silicon semiconductor industry.
Containers are fabricated from stainless steel with an electropolished internal finish and are equipped with dip tube for top discharge and diaphragm valves. The diaphragm valves are equipped with metal gasket face seal connections.
TEAl SSG is an aluminum precursor (Select Semiconductor Grade) for deposition technologies used in the silicon semiconductors industry.