Nouryon is exhibiting at the ICPT 2026 (International Conference on Planarization/CMP Technology) October 19-22 in Seoul, South Korea.
Innovative ingredients for advanced CMP applications
Our Nouryon solutions support enhanced slurry performance, effective post-CMP cleaning, and optimized CMP pad porosity, helping enable the next generation of semiconductor devices.
Surface Control for CMP Slurries and Post-CMP Cleaners
- Levasil® colloidal silica abrasives for superior surface finishing
- Versa TL®, Alcoperse®, and Aquatreat® dispersants for particle stability and formulation performance
- Dissolvine® chelating agents for trace metal control
- Armeen® and Ethomeen® surfactants for tuning abrasive and surface interaction
Porosity Control for CMP Pads
- Expancel® microspheres for tailored pore generation
Visit our booth to learn more about Nouryon's essential solutions for surface polishing and treatment in CMP applications. We are looking forward to seeing you at ICPT!
For more information, visit the ICPT website.
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- Science & Technology Convention Center
- Seoul
- South Korea
Related applications
Get in touch!
For more information about our Levasil® colloidal silica products, please contact our experts. We look forward to hearing from you.
If you prefer to call us you can reach us at:
China, Shanghai: +86 21 22205000
Brazil, Jundiaí: +55 11 45894800
Germany, Cologne: +49 221 995850
India, Mumbai:+91 22 6842 6700
Japan, Tokyo:+81 356436001
Singapore: +65 6635 5327; 6635 5203
Sweden, Bohus: +46 31 587000
Taiwan - Greater China, Taichung: +886 4 23270520
USA, Houston: +1 312 3206109