ICPT 2026

Seoul, South Korea

Nouryon is exhibiting at the ICPT 2026 (International Conference on Planarization/CMP Technology) October 19-22 in Seoul, South Korea.


Innovative ingredients for advanced CMP applications

Our Nouryon solutions support enhanced slurry performance, effective post-CMP cleaning, and optimized CMP pad porosity, helping enable the next generation of semiconductor devices.


Surface Control for CMP Slurries and Post-CMP Cleaners

  • Levasil® colloidal silica abrasives for superior surface finishing
  • Versa TL®, Alcoperse®, and Aquatreat® dispersants for particle stability and formulation performance
  • Dissolvine® chelating agents for trace metal control
  • Armeen® and Ethomeen® surfactants for tuning abrasive and surface interaction

Porosity Control for CMP Pads

  • Expancel® microspheres for tailored pore generation

Visit our booth to learn more about Nouryon's essential solutions for surface polishing and treatment in CMP applications. We are looking forward to seeing you at ICPT!

For more information, visit the ICPT website.

    • Science & Technology Convention Center
    • Seoul
    • South Korea

Related applications

Young woman standing outside checking her tablet. Our products are essential in the production of semiconductors and are used in applications like solar cells, LEDs, smartphones and tablets.

Electronics

Our products are widely used in chemical-mechanical planarization, metal surface treatment and more. Get a quick overview of our specialty chemicals.

Get in touch

For more information about our Levasil® colloidal silica products, please contact our experts. We look forward to hearing from you.

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