TMAl IC

High purity metalorganics

High Purity Metalorganics

TMAl IC is an aluminum precursor for atomic layer deposition (ALD) processes.

  • Product name

    TMAl IC
  • Chemical family

    High Purity Metalorganics
  • CAS number

    75-24-1
  • Physical form

    Liquid
  • Chemical name

    Trimethylaluminum
  • Molecular Weight

    72.1
  • Applications

    For atomic layer deposition (ALD) in Silicon semiconductor applications we offer our TMAL IC grade. This grade offers ppb level of trace metals specifications. Our trimethylaluminum is supplied in canisters (cylinders) made from stainless steel with an electropolished internal finish. The cylinders are equipped with manual or pneumatic diaphragm valves. The valves are equipped with metal gasket VCR-connections.

Market Segments

Electronics

Detailed description

TMAl IC is an aluminum precursor (Select Semiconductor Grade) for deposition technologies used in the silicon semiconductors industry.

Functions

  • Precursor

Applications

  • Electronic Devices
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Get in touch!

For more information about TMAl IC, please contact our technical experts. We look forward to hearing from you.

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