High purity metalorganics
TMAl IC is an aluminum precursor for atomic layer deposition (ALD) processes.
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Product name
TMAl IC -
Chemical family
High Purity Metalorganics -
CAS number
75-24-1 -
Physical form
Liquid -
Chemical name
Trimethylaluminum -
Molecular Weight
72.1 -
Applications
For atomic layer deposition (ALD) in Silicon semiconductor applications we offer our TMAL IC grade. This grade offers ppb level of trace metals specifications. Our trimethylaluminum is supplied in canisters (cylinders) made from stainless steel with an electropolished internal finish. The cylinders are equipped with manual or pneumatic diaphragm valves. The valves are equipped with metal gasket VCR-connections.
Market Segments
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For more information about TMAl IC, please contact our technical experts. We look forward to hearing from you.