TMAl IC is an aluminum precursor for atomic layer deposition (ALD) processes.
High Purity Metalorganics
For atomic layer deposition (ALD) in Silicon semiconductor applications we offer our TMAL IC grade. This grade offers ppb level of trace metals specifications. Our trimethylaluminum is supplied in canisters (cylinders) made from stainless steel with an electropolished internal finish. The cylinders are equipped with manual or pneumatic diaphragm valves. The valves are equipped with metal gasket VCR-connections.
TMAl IC is an aluminum precursor (Select Semiconductor Grade) for deposition technologies used in the silicon semiconductors industry.