Product Line High purity metalorganics

TMAl IC is an aluminum precursor for atomic layer deposition (ALD) processes.

  • Chemical family

    High Purity Metalorganics
  • CAS number

  • Physical form

  • Molecular Weight

  • Chemical name

  • Molecular drawing

    High Purity Metalorganics
  • Applications

    For atomic layer deposition (ALD) in Silicon semiconductor applications we offer our TMAL IC grade. This grade offers ppb level of trace metals specifications. Our trimethylaluminum is supplied in canisters (cylinders) made from stainless steel with an electropolished internal finish. The cylinders are equipped with manual or pneumatic diaphragm valves. The valves are equipped with metal gasket VCR-connections.

Market Segments


Detailed description

TMAl IC is an aluminum precursor (Select Semiconductor Grade) for deposition technologies used in the silicon semiconductors industry.


  • Precursor


  • Electronic Devices
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For more information about TMAl IC, please contact our technical experts. We look forward to hearing from you.

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