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TMAL, Trimethylaluminum, CAS 75-24-1, Metal Alkyls organometallics, TMAL is used as a cocatalyst in the Ziegler-Natta polymerization of olefins. TMAL is also used in the production of compound semiconductors used in electronic devices.

TMAl LO, Trimethylaluminum, CAS 75-24-1, High Purity Metalorganics, TMAl LO is an aluminum precursor for the deposition of compound semiconductors, especially synthesized to meet ultra low-oxygen requirements.

TMAl SSG, Trimethylaluminum, CAS 75-24-1, High Purity Metalorganics, TMAl SSG is an aluminum precursor for the deposition of compound semiconductors.

TMAl IC, Trimethylaluminum, CAS 75-24-1, High Purity Metalorganics, TMAl IC is an aluminum precursor for atomic layer deposition (ALD) processes.

TMAl Solar, Trimethylaluminum, CAS 75-24-1, High Purity Metalorganics, TMAl Solar is a special trimethylaluminum grade used to create an aluminum oxide passivation layer to increase efficiency of solar cells.

Our HPMOs are used in a huge range of industrial and consumer products. These include lasers, solar cells, LED's and high mobility transistors for mobile phones.

Expanding carboxymethyl cellulose (CMC) portfolio delivers key functionalities for the battery market.  - [Sept 2024]

Nouryon and US-based startup Forge Nano have agreed to explore a joint collaboration in ultra-thin coatings for high-growth applications including batteries and catalysts. The technology, called atomic layer deposition (ALD), also has the potential to open up entirely new applications.