Nouryon is exhibiting at the International Conference on Planarization/CMP Technology in Wiesbaden on October 16-18, 2024.
Nouryon Booth: Visit booth #6 to learn more about Nouryon's essential solutions for surface polishing and treatment in CMP applications.
Key Points
Chemical Mechanical Planarization/Polishing (CMP): A critical process in semiconductor manufacturing, continually evolving to meet technical demands and expanding its applications beyond just semiconductors.
ICPT Conference: An international symposium for discussing a wide range of CMP technologies and applications, including:
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Opportunities at ICPT
Networking and discussions: Meet our Nouryon experts on Levasil® colloidal silica — a high-tech abrasive used for shaping, smoothing, and polishing precision substrate materials to achieve ultra-flat, low-defect, and uniform surfaces.
We are looking forward to seeing you at ICPT!
For more information, visit the ICPT website.
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- Kurhaus Wiesbaden
- Kurhausplatz 1
- 65189 , Wiesbaden
- Germany
Related applications
Get in touch!
For more information about our Levasil® colloidal silica products, please contact our experts. We look forward to hearing from you.
If you prefer to call us you can reach us at:
China, Shanghai: +86 21 22205000
Brazil, Jundiaí: +55 11 45894800
Germany, Cologne: +49 221 995850
India, Mumbai:+91 22 6842 6700
Japan, Tokyo:+81 356436001
Singapore: +65 6635 5327; 6635 5203
Sweden, Bohus: +46 31 587000
Taiwan - Greater China, Taichung: +886 4 23270520
USA, Houston: +1 312 3206109